Future ultra-precision optical components are characterized by structural features of object processing

In the IC industry, to meet the modern requirements of microprocessors and other chips require more detailed characteristic width of the silicon surface with nanoscale surface accuracy and sub-nanometer surface roughness, while ensuring no deterioration of surface and sub-surface layer, without damage, which is close to the limit of surface  grinding wheel . The foreseeable future ultra-precision optical components are characterized by processing object structure characteristic scales in the tens of nanometers, the surface roughness in the sub-nanometer order of magnitude, while  Polycrystalline diamond  high processing efficiency, process stability. In the experimental process, based on the combination of 2 kinds of processes, carried out on the silicon nano-precision mirror processing of experiments obtained efficiently than the surface roughness and shape accuracy of the optical surface.